Date: Tuesday, May 17, 2016
Time: 11:00 am
Speaker: Christopher Kemper Ober, Cornell University
Title: Molecular Foundry/ALS Joint Seminar: Fifty Years of Moore's Law – Towards Fabrication at Molecular Dimensions
Location: Building 66 Auditorium
In the last half century, critical dimensions in electronic devices have been reduced from micrometers to a few tens of nanometers on a pace that has been consistent for decades. Lithography now touches many areas of science ranging from electronics to biology and the life sciences. To continue on this remarkable path predicted in 1965 and to approach molecular scale pattern formation, new breakthroughs in patterning methods are needed. This talk will focus on new concepts, methods and materials, in particular efforts in directed self-assembly (DSA) and short wavelength extreme ultraviolet (EUV) lithography. DSA harnesses the phase behavior of block copolymers to create patterns defined by the microstructure of the polymer. In contrast, EUV patterning enables the production of arbitrary patterns at similar length scales. These and other advances in lithography will be described.