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July 2014

Chemically Amplified Molecular Photoresist for High-Resolution Lithography

Scientific Achievement

Users from Intel collaborated with staff from the Molecular Foundry and the ALS to create a new approach to photoresist that achieves both high-resolution and sensitivity.

Significance and Impact

Current photoresist designs have a tradeoff between resolution and sensitivity but this approach could lead to resists capable of patterning features at the molecular level with high sensitivity.

Research Details

P. K. Kulshreshtha,K. Maruyama, S. Kiani, J. Blackwell, D. L. Olynick & P. D. Ashby. Nanotechnology 2014 25, 31.