NANOFABRICATION FACILITY

(publications as of 6/12/08)

Jumpstart Phase

1. J. A. Liddle, P. Naulleau and G. M. Schmid, "Probe Shape Measurement in an Electron Beam Lithography System", Journal of Vacuum Science and Technology 22 (6), 2897-2901 (2004).    [pdf]
   
2. G. M. Schmid, L. E. Carpenter and J. A. Liddle, "Nonaqueous Development of Silsesquioxane Electron Beam Resist", Journal of Vacuum Science and Technology 22 (6), 6 (2004).    [pdf]
   
3. D. Olynick, J. A. Liddle and I. W. Rangelow, "Profile Evolution of Cr Masked Features Undergoing Hbr-Inductively Coupled Plasma Etching for Use in 25 Nm Silicon Nanoimprint Templates", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23 (5), 4 (2005).    [pdf]
   

Operations Phase

1. A. Persaud, J. A. Liddle, T. Schenkel, J. Bokor, T. Ivanov and I. W. Rangelow, "Ion Implantation with Scanning Probe Alignment", Journal of Vacuum Science & Technology B 23 (6), 2 (2005).    [pdf]
   
2. D. Olynick, A. V. Tivanski, M. K. Gilles, T. Tyliszczak, F. Salmassi, J. A. Liddle, K. Liang and S. R. Leone, "Scanning X-Ray Microscopy Investigations into the Electron Beam Exposure Mechanism of Hydrogen Silsesquioxane Resists", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 24 (6), 6 (2006).    [pdf]
   
3. E. D. Fabrizio, F. Romanato, S. Cabrini, F. Deangelis, A. A. Yu, R. Barsotti, G. D. Giustina, G. Brusatin and F. Stellacci, presented at the Materials Research Society Spring Meeting Symposium T proceedings, San Francisco, 2006 (unpublished).
   
4. Z. Hao, M. C. Martin, B. Harteneck, S. Cabrini and E. H. Anderson, "Negative  Index of Refraction Observed in a Single Layer of Closed Ring Magnetic Dipole Resonators", Applied Physics Letters 91 (25), 253119 (2007).    [pdf]