Specialized Instrumentation Available to Users
JEOL 2100-F 200 kV Field-Emission Analytical Transmission Electron Microscope
This instrument is equipped with an analytical pole piece, a high solid-angle EDS (energy dispersive spectroscopy) system for elemental x-ray analysis, a Gatan Tridiem spectrometer for energy-filtered imaging and spatially-resolved EELS (electron energy loss spectroscopy), a HAADF (high-angle annular dark field) STEM detector, and several digital cameras. Single and double tilt sample holders and software for TEM tomography (3D image reconstruction).
Zeiss Gemini Ultra-55 Analytical Scanning Electron Microscope
This microscope is used for imaging and analysis of conducing and insulating samples. The SEM has multiple detectors including in-lens and conventional secondary electron detectors, in-lens and quadrant backscatter detectors, an EDS system for elemental x-ray analysis, and a transmission (STEM) bright/dark field detector compatible with standard TEM grids. Beam energy is variable between 30 kV and 100 kV, with 1 nm resolution above 2 kV and several nm resolution at 100 eV. A range of sample holders are available including standard SEM stubs, wafers to 4”, flat, tilted and cross section holders for wafer pieces, and for TEM grids.
Zeiss Gemini Supra 55 VP-SEM
This instrument, used for in situ microscopy, has SEM in-lens and conventional secondary detectors, quadrant backscatter detector and a variable pressure (10-100 Pa) secondary detector. It can be configured for various types of in situ experiments including nano-manipulation, scanning probe microscope imaging, mechanical and electrical characterization and in situ chemical and thermal reactions.
Agilent (Molecular Imaging) PicoPlus Scanning Probe Microscope
This microscope is used for in situ imaging in air, controlled gas/humidity or in liquids, including under electrochemical control.This system includes 90 micron and 5 micron AFM scanners and a 1 micron STM scanner. A range of AFM contrast methods are available including contact/friction imaging, non-contact (“tapping”) phase and amplitude imaging, and electrical methods including conductivity, tunneling, electrostatic and Kelvin probe surface potential imaging. Atomic lattice resolution on gold or mica can be routinely achieved with suitable tips.
Asylum MFP-3D Atomic Force Microscope
This microscope has a 90 micron closed-loop XY scanner, Z displacement and integrated optical imaging. A range of AFM contrast methods are available including contact imaging, non-contact (“tapping”) phase and amplitude imaging, and electrical methods including conductivity, electrostatic and Kelvin probe surface potential imaging. The system has a small-volume closed fluid cell that can be used for rapid, controlled humidity experiments or liquid experiments with fluid exchange. The control software is easily customized for specialized force or lithography experiments.
Foundry-built ultra-low noise AFM
This microscope is used for measuring chemical interaction forces in air or liquids with a 5 micron closed-loop XYZ scanner. Uses Asylum control system.
PHI 5400 X-ray photoelectron spectroscopy (XPS) system
This system allows:
- conventional (non-monochromatic) Al/Mg Dual-Anode X-ray source
- spatial resolution 0.5 mm, energy resolution 0.7 eV
- conducting or insulating samples (ultra-high vacuum compatible) up to 20 mm square, 4 mm thick
- 4 kV Argon ion sputtering for sample cleaning and shallow (100 nm) depth profiles
- elemental and chemical state analysis of the first few nm of the surface with ~ 1 atomic percent sensitivity
PHI 660 Scanning Auger (SAM) system with CeB6 electron gun, 1.5 to 15 kV with ~1 micron spatial resolution in Auger mode at 0.4% energy resolution.
SEM imaging to 10,000X. 5 kV Ar and 20 kV Ga ion guns
This instrument enables sputter-cleaning and depth profiling (up to ~ 10 microns deep with Ga). Samples must be ultra-high vacuum compatible and conducting (thin insulating films on conducting substrates OK), up to 20 mm square, 4 mm thick. Elemental analysis of the first 1-2 nm of the surface with ~ 1 atomic percent sensitivity.
Optical Spectro-Microscopy Lab
- Broadly tunable ultra-fast laser system (Coherant MiraTi:SAF + OPG) operating in picosecond and femotsecond modes
- Visible and infrared CW laser sources
- Optical grating spectrometers with CCD cameras/detectors (nitrogen cooled and electron-multiplied), single photon counting modules
- Diffraction-limited confocal optical spectroscopy station (#1) for scattering, Raman, and fluorescence (both linear and nonlinear), including measurements on single molecules and nanostructures
- Tip-enhanced (near field) optical imaging and spectroscopy and tip-enhanced Raman spectroscopy (TERS)
- Variable temperature optical spectroscopy station (#2) for scattering, Raman, fluorescence (both linear and nonlinear), including measurements on single molecules and nanostructures from 5 to 300 K
Optical Microscopy
Leica DM4000 Optical Microscope
This microscope is appropriate for materials science (non-inverted, dry samples). 5x to 100x objectives; bright field/dark field/DIC/Polarization in transmitted or reflected light; color camera and software.
Leica MZ16 Stereo microscope
Appropriate for sample inspection, probing and manipulation, 19 mm working distance, magnification 11 to 180x, color camera and software.
Sample preparation tools
Various sample preparation tools including Langmuir Blodgett trough, UV ozone cleaner, oxygen plasma cleaner, mg balance, ultrasonic bath, 200 C oven and thermal evaporator.
