Publications from Facility Staff
2011 |2010-2009 | 2008-2004
- J. Zhang, T. E. Pick, D. Gargas, S. Dhuey, E. M. Chan, Y. Wu, X. Liang, P. J. Schuck, D. L. Olynick, B. A. Helms, and S. Cabrini, "Probe field enhancement in photonic crystals by upconversion nanoparticles," J. Vac. Sci. Technol. B 29, 06F403 (2011). [pdf]
- A. McLeod, A. Weber-Bargioni, Z. Zhang, S. Dhuey, B. Harteneck, J. B. Neaton, S. Cabrini, P. James Schuck, “Nonperturbative visualization of nanoscale plasmonic field distributions via photon localization microscopy,” Phys. Rev. Lett. 106, 037402 (2011) [pdf]
- A. Weber-Bargioni, A. Schwartzberg, M. Cornaglia, A. Ismach, J. J. Urban, Y. Pang, R. Gordon, J. Bokor, M. B. Salmeron, D. F. Ogletree, P. Ashby, S. Cabrini, P. James Schuck, “Hyperspectral Nanoscale Imaging on Dielectric Substrates with Coaxial Optical Antenna Scan Probes,” Nano Lett., 11, 3, 1201 (2011). [pdf]
- A. T. Zayak, Y. Hu, H. Choo, S. Cabrini, P. J. Schuck, and J. B. Neaton, “Chemical Raman Enhancement of Organic Adsorbates on Metal,” Phys. Rev. Lett., 106, 083003, (2011). [pdf]
- V. S. D. Voet, T. E. Pick, S-M. Park, M. Moritz, A. T. Hammack, J. J. Urban, D. F. Ogletree, D. L. Olynick, and B. A. Helms, “Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography,” Journal of the American Chemical Society, 133, 9, 2812 (2011). [pdf]
Fluoroalkyl-modified homopolymer (FA-polymer) additives promote mold release and self-assembly in block copolymer thin films during thermal nanoimprint processes. Subsequent lithographic steps reveal underlying equilibrium phase segregated morphologies, which show a high degree of graphoepitaxial alignment with the mold features over the imprinted area.
