Deirdre Olynick
Staff Scientist, Nanofabrication Facility
dlolynick@lbl.gov
510.495.2893
Research Interests
- Nanoimprint template fabrication
- E-beam lithography
- Resist processing and chemistry
- Nanoscale plasma etching
Current Projects
- Plasma etching of micro and nanoscale silicon features with ultra-smooth sidewalls
- Profile evolution of Cr masked features undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates
We have developed nanoscale Si templates for single-layer and bilayer nanoimprint lithography used for the production of molecular electronic devices.1 The Si templates can be used directly for thermoplastic or thermoset imprint resists or transferred to quartz substrates using ultraviolet-curable resists for quartz template replication. Learn more
- Deirdre L. Olynick, J. Alexander Liddle, Ivo W. Rangelow
- Profile evolution of Cr masked features undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates
- Nano-imprint template lithography and etching
- Electrostatic Force Assisted Exfoliation of Prepatterned Few-Layer Graphenes into Device Sites
We present a novel fabrication method for incorporating nanometer to micrometer scale few-layer graphene (FLG) features onto substrates with electrostatic exfoliation. We pattern highly oriented pyrolytic graphite using standard lithographic techniques and subsequently, in a single step, exfoliate and transfer-print the prepatterned FLG features onto a silicon wafer using electrostatic force. Learn more
- Xiaogan Liang, Allan S. P. Chang, Yuegang Zhang, Bruce D. Harteneck, Hyuck Choo, Deirdre L. Olynick and Stefano Cabrini
- Electrostatic Force Assisted Exfoliation of Prepatterned Few-Layer Graphenes into Device Sites
- Systematic determination of optimum resist/solvent development chemistry for sub-10 nm resolution
- Fundamentals of plasma etching for sub-20 nm features and beyond.
Selected publications
- Olynick, D. L; Liddle, J. A.; Harteneck, B. D., Cabrini S.; Rangelow, I. W. Nanoscale pattern transfer for templates, NEMS, and nano-optics, Proceedings of SPIE 6462 (2007).
- Olynick, D. L.; Rangelow, I.; Liddle, J. A.; "Silicon Nanopatterning using Cr hard-mask and HBr plasma chemistry"; Journal of Vacuum Science & Technology B; Microelectronics and Nanometer Structures (2005), 23(5), 2073-2077
- Olynick, Deirdre L.; Harteneck, Bruce D.; Veklerov, Eugene; Tendulkar, Mihir; Liddle, J. Alexander; Kilcoyne, A. L. David; Tyliszczak, Tolek. 25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures--Processing, Measurement, and Phenomena (2004), 22(6), 3186-3190.
- Jung, G.-Y.; Olynick, D. L.; Straznicky, J.; Li, Z.; Li, X.; Ohlberg, D. A. A.; Chen, Y.; Wang, S.-Y.; Liddle, J. A.; Tong, W. M.; Williams, R. Stanley. One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography. Applied Physics A: Materials Science & Processing (2005), A80(6), 1173-1178.
- Olynick, D. L.; Gibson, J. M.; Averback, R. S. Impurity-suppressed sintering in copper nanophase materials. Philosophical Magazine A: Physics of Condensed Matter: Structure, Defects and Mechanical Properties (1998), 77(5), 1205-1221.
Education
B. S. Engineering, North Carolina State University, Raleigh, N. C.
Ph.D. Department of Materials Science and Engineering. University of Illinois at Urbana-Champaign. Advisor: J. Murray Gibson. Fannie and John Hertz Fellowship
Thesis: “In situ Studies of Copper Nano-particles Using a Novel Tandem Ultra-High Vacuum Particle Production Chamber Transmission Electron Microscope”
Past Professional Positions
Applied Materials and Technology and Matrix Integrated Systems, Senior Process Engineer
