Imaging and Manipulation of Nanostructures Facility
Miquel Salmeron, This facility provides instruments and techniques for characterization and manipulation of a broad variety of nanostructures, from hard to very soft matter including liquid structures. Microscopic imaging methods span electron, optical and scanning probe microscopy, including combined electron-scanning probe and near-field optical-scanning probe microscopes. Nanostructure characterization tools include surface analysis (Auger, XPS) and advanced optical spectro-microscopy (linear, non-linear, tip-enhanced and pump-probe). Staff has broad experience in
Capabilities
Facility Research Program |
Tools and Instruments
JEOL 2100-F 200 kV Field-Emission Analytical
Transmission Electron Microscope. Zeiss Gemini Ultra-55 Analytical Scanning Electron Microscope for imaging and analysis of conducing and insulating samples.The SEM has multiple detectors including in-lens and conventional secondary electron detectors, in-lens and quadrant backscatter detectors, an EDS system for elemental x-ray analysis, and a transmission (STEM) bright/dark field detector compatible with standard TEM grids. Beam energy is variable between 30 kV and 100 kV, with 1 nm resolution above 2 kV and few nm resolution at 100 eV. A range of sample holders are available including standard SEM stubs, wafers to 4”, flat, tilted and cross section holders for wafer pieces, and for TEM grids. Zeiss Gemini Supra 55 VP-SEM for in-situ microscopy with SEM in-lens and conventional secondary detectors, quadrant backscatter detector and variable pressure (10-100 Pa) secondary detector. This instrument can be configured for various types of in-situ experiments including nano-manipulation, scanning probe microscope imaging, mechanical and electrical characterization and in-situ chemical and thermal reactions. Various in-situ capabilities are being implemented through 2007. Agilent (Molecular Imaging) PicoPlus Scanning Probe Microscope system for in situ imaging in air, controlled gas/humidity or in liquids, including under electrochemical control.This system includes 90 micron and 5 micron AFM scanners and a 1 micron STM scanner. A range of AFM contrast methods are available including contact/friction imaging, non-contact (“tapping”) phase and amplitude imaging, and electrical methods including conductivity, tunneling, electrostatic and Kelvin probe surface potential imaging. Atomic lattice resolution on gold or mica can be routinely achieved with suitable tips. Asylum MFP-3D Atomic Force Microscope system with 90 micron closed loop XY scanner Z displacement and integrated optical imaging.A range of AFM contrast methods are available including contact imaging, non-contact (“tapping”) phase and amplitude imaging, and electrical methods including conductivity, electrostatic and Kelvin probe surface potential imaging. The system has a small-volume closed fluid cell that can be used for rapid controlled humidity experiments or liquid experiments with fluid exchange. The control software is easily customized for specialized force or lithography experiments. Foundry-built ultra-low noise AFM for
measuring chemical interaction forces in air or liquids with
5 micron closed-loop XYZ scanner. Uses Asylum control
system. PHI 5400 X-ray photoelectron spectroscopy (XPS) system with conventional (non-monochromatic) Al/Mg Dual-Anode X-ray source. Spatial resolution 0.5 mm, energy resolution 0.7 eV. Conducting or insulating samples (ultra-high vacuum compatible) up to 20 mm square, 4 mm thick. 4 kV Argon ion sputtering for sample cleaning and shallow (100 nm) depth profiles. Elemental and chemical state analysis of the first few nm of the surface with ~ 1 atomic percent sensitivity. PHI 660 Scanning Auger (SAM) system with CeB6 electron gun, 1.5 to 15 kV with ~1 micron spatial resolution in Auger mode at 0.4% energy resolution. SEM imaging to 10,000 X. 5 kV Ar and 20 kV Ga ion guns for sputter-cleaning and depth profiling (up to ~ 10 microns deep with Ga). Samples must be ultra-high vacuum compatible and conducting (thin insulating films on conducting substrates OK), up to 20 mm square, 4 mm thick. Elemental analysis of the first 1-2 nm of the surface with ~ 1 atomic percent sensitivity. Optical Spectro-Microscopy Lab
Optical Microscopy Leica DM4000 Optical Microscope for materials science (non-inverted, dry samples). 5x to 100x objectives; bright field/dark field/DIC/Polarization in transmitted or reflected light; color camera and software. Leica MZ16 Stereo microscope for sample inspection, probing and manipulation, 19 mm working distance, magnification 11 to 180x, color camera and software. Sample preparation. Various sample preparation tools including Langmuir Blodgett trough, UV ozone cleaner, oxygen plasma cleaner, mg balance, ultrasonic bath, 200 C oven, thermal evaporator. |
A U.S. Department of Energy National Laboratory Operated by the University of California
