Arradiance XT-P Atomic Layer Deposition
Atomic Layer Deposition tool. Used mostly for Vapor Phase Infiltration into polymer for hybrid films. Thermal mode. Plasma mode available with detachable RF unit. Ozone source available. QCM for mass uptake measruements. Up to 300C. Up to 200 mm substrate size. 1.25″ sample clearance. Up to four precursors (most commonly used for AlOx, SiOx, SnOx, HfOx)
