The following instruments are available to Molecular Foundry staff and users through an MOU between the Chemical Sciences Division and the Molecular Foundry Division. Contact Finn Babbe for more information. To request instrument access, please use this form.
XRD (Room 105/113)
Determination of crystal structure and film thickness. The Rigaku x-ray diffraction instrument has a 2D hypix detector, in-plane mode for ultra-thin film characterization, and Eulerian cradle (pole figures). Further the system is capable of in-situ characterization of thermal processing of materials in air, Ar, N, NH3, and O2 up to 800°C.
XPS (Room 119)
Kratos Axis Ultra DLD system with monochromatized Al K-alpha, non monochromatic Al and Mg emission, and UPS (He source). Capability for depth profiling (Ar-ion sputtering), heating and cooling of samples, and angle dependent measurements. (Limited capacity for Foundry users)
Mapping Ellipsometer (Room 120)
Used for determination of complex dielectric properties of thin films materials from 180 – 1600 nm including reflection and transmission intensities, with in-situ temperature control (100 – 1200 K), in-situ electrochemical cell
JA Woollam M-2000DI
NMR (Room 120)
Bruker Advance III 500 High Performance Ascend NMR (500 MHz / 54 mm Ascend), Topshim 3.6.2, Probe: PA BBO 500S1 BBF-H-D-05 ZSP, Autosampler
SEM (Room 122)
~50 nm resolution imaging microscope , and elemental mapping by energy dispersive x-ray (EDX) with environmental mode. Instrument: FEI Quanta FEG-250
Raman Confocal Microscope (Room 123)
Measurement of Raman spectra of materials to determine crystallographic phase identification, quality, and transformations including under in-operando electrochemical conditions. Horiba Jobin Yvon LabRam HR 800, high resolution Raman microscopy with 633 / 532 nm excitation and XY mapping stage, 1800 and 600 lines gratings.
ICP-MS (Room 305)
Analytical technique for measuring elements at trace levels in liquids and dissolved samples. Instrument: Agilent ICP-MS 7900
