Vistec VB300 Electron Beam Lithography System
A fundamental piece of equipment in any nanofabrication laboratory is the electron beam lithography (EBL) system. The VB300 is a state-of-the-art tool from Vistec Lithography Limited (now Raith) used to create lithographic patterns in a resist for applications in areas such as nanoelectronics, photonics, biotechnology, and magnetics. The tool spot size is less than 3 nm allowing sub-10 nm features to be patterned. Overlay accuracy is 2-10 nm within the 1.2 mm writing field and 15-30 nm field-to-field. The tool runs throughout the day and night to maximize usage. The EBL can handle wafer pieces and full wafers up to 200 mm. A 300 mm handler is planned for the future. The e-beam is operated by Molecular Foundry staff and not directly by Users.
Raith EBPG5200 Ultra High Performance Electron Beam Lithography System
The Raith EBPG5200 is a lithography tool that will allow the high resolution patterning over large areas and on large variety of substrate giving the possibility to explore novel pattern devices in the field of nanophotonic, nano-electronics, QIS, nanomechanics, nanobiology, and more. It hosts a 100 kV electron electron beam and a 125 MHz Pattern Generator. It has a 1 mm maximum field size, and also has a Z-Lift Stage for thick/curved substrates and a Ten-holder Airlock. Its alignment precision to markers is ≤ ± 5 nmm and line width resolution ≤ 8 nm at 200 pA and ≤ 15 nm at 20 nA. The e-beam is operated by Molecular Foundry staff and not directly by Users.