Vistec VB300 Electron Beam Lithography System
A fundamental piece of equipment in any nanofabrication laboratory is the electron beam lithography (EBL) system. The VB300 is a state-of-the-art tool from Vistec Lithography Limited (now Raith) used to create lithographic patterns in a resist for applications in areas such as nanoelectronics, photonics, biotechnology, and magnetics. The tool spot size is less than 3 nm allowing sub-10 nm features to be patterned. Overlay accuracy is 2-10 nm within the 1.2 mm writing field and 15-30 nm field-to-field. The tool runs throughout the day and night to maximize usage. The EBL can handle wafer pieces and full wafers up to 200 mm. A 300 mm handler is planned for the future. The e-beam is operated by Molecular Foundry staff and not directly by Users.