Raith EBPG5200 Ultra High Performance Electron Beam Lithography System
The Raith EBPG5200 is a lithography tool that will allow the high resolution patterning over large areas and on large variety of substrate giving the possibility to explore novel pattern devices in the field of nanophotonic, nano-electronics, QIS, nanomechanics, nanobiology, and more. It hosts a 100 kV electron electron beam and a 125 MHz Pattern Generator. It has a 1 mm maximum field size, and also has a Z-Lift Stage for thick/curved substrates and a Ten-holder Airlock. Its alignment precision to markers is ≤ ± 5 nmm and line width resolution ≤ 8 nm at 200 pA and ≤ 15 nm at 20 nA. The e-beam is operated by Molecular Foundry staff and not directly by Users.
