Zeiss Crossbeam 1540 EsB
The Molecular Foundry Zeiss Cross-beam is one of the most versatile lithographic and inspection tools allowing fabrication of complex prototypes for nanoelectronics, nano-optical antenna, modifying scanning probe tips, rapid electrical contacting and many other applications. The 1500XB Cross Beam combines the Gemini field emission column (FESEM) with the Orsay Physics focused ion beam (FIB). In addition, the instrument offers a multi-channel gas injection system to allow ion and electron beam induced deposition (IBID and EBID) and chemically assisted ion beam etching (CAIBE). The tool can be used for lithographic patterning of materials or for inspection. Three-dimensional patterning is possible with FIB or CAIBE. Additions to the tool include a Xenos Pattern Generator and an Argon/Oxygen ion gun. The Xenos pattern generator allows the ion and electron beam to write computer-generated patterns while the Argon/Oxygen ion gun allows milling of layers over an area of several millimeters. Samples sizes can range from scanning probe tip size to four-inch wafers.
Zeiss Ultra 60-SEM
The Zeiss Ultra 60 is a Scanning Electron Microscope using the good imaging capabilities of the GEMINI® field emission column (FESEM). It comprises dual In-column detectors for ultra high resolution topographical and compositional imaging. The new In-column EsB (Energy selective Backscatter) detector is less sensitive for edge contrast and charging effects which enables precise feature imaging and reliable metrology. It delivers superb materials contrast and crystallographic imaging.