Multiphonon Processes
Transient Absorption
The Ultrafast Laser Lab
This lab is a beam-line style User Facility for lithography, characterization, and deposition technique development. A two-photon photolithography instrument will allow for three-dimensional photolithographic structures on the sub-micron scale. This instrument will be implemented with a force probe and near-field plasmonic tip structure to allow for 3D structure lithography at single-digit nanoscale dimensions. For characterization, an ultrafast-systems transient absorption spectrometer has been installed and allows the monitoring of electronic relaxation dynamics on sub 100-femtosecond time scales. In addition, femtosecond stimulated Raman instrumentation is being developed to probe charge transfer dynamics and gas phase thin film deposition precursor photochemistry. Finally, we are developing a new type of atomic layer deposition process that will use gas phase photochemistry to prepare active precursors of a wide variety of materials. Coherent Libra amplified femtosecond laser (45 fs pulse duration)
- Coherent OPerA solo OPA tunable source (270 nm – 2600 nm)
- Ultrafast systems transient absorption spectrometer
- Home-built femtosecond stimulated Raman system for solid, liquid, and gas phase (~20 fs temporal resolution)
- Home-built high temporal resolution transient absorption system for both bulk and microscopic samples (~20 fs)
- Home-built second harmonic generation microscope
- Biophotonic solutions MIIPS Box 640 pulse shaper for coherent control and microscopy applications
Collaboration with the Inorganic Facility
Ultrafast in situ transient absorption spectroscopy during precursor/sample heating
