Scientific Achievement
A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography.
Significance and Impact
This technique allows the life of current optical lithography techniques to be extended by reducing the pitch without requiring technological improvement in optical resolution. Atomic layer deposition and spacer double patterning are combined to increase the spatial frequency of gratings on nanoimprint templates. The remaining 20 nm pitch gratings are replicated by step-and-repeat UV nanoimprint lithography.
Research Details
- ALD enabled spacer double patterning technique doubles the spatial frequency of gratings on a nanoimprint lithography template without requiring technological advancements in optical resolution.
- A plasma enhanced ALD process is used for deposition of a spacer over a patterned resist. The surface of the spacer is etched away and the resist removed, leaving 20 nm pitch gratings, which are replicated by step-and-repeat UV nanoimprint lithography.
